Author:
Meng W. J.,Zhang X. D.,Shi B.,Tittsworth R. C.,Rehn L. E.,Baldo P. M.
Abstract
A series of Ti–Si–N coatings with 0 < Si < 20 at.% were synthesized by inductively coupled plasma assisted vapor deposition. Coating composition, structure, atomic short-range order, and mechanical response were characterized by Rutherford backscattering spectrometry, transmission electron microscopy, x-ray absorption near-edge structure spectroscopy, and instrumented nanoindentation. These experiments show that the present series of Ti–Si–N coatings consists of a mixture of nanocrystalline titanium nitride (TiN) and amorphous silicon nitride (a-Si:N); i.e., they are TiN/a-Si:N ceramic/ceramic nanocomposites. The hardness of the present series of coatings was found to be less than 32 GPa and to vary smoothly with the Si composition.
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Cited by
53 articles.
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