Author:
Vladimirsky Yuli,Scott John D.,Bhattacharya Pradeep K.
Abstract
AbstractA systematic approach for predicting radiation stability of materials and devices is presented. The conceptual basis is a consideration of the radiolysis potentially occurring in x-ray-irradiated materials as a multi-stage process: a) primary radiation excitations (PRE); b) secondary generation of isolated electronic and structural defects resulting from PRE relaxation; and c) interaction, accumulation, and coagulation of defects resulting in change of device electronic properties and in degradation of optical material. This predictive technique involves specific relevant information in a relatively simple context for the purpose of modeling the radiolysis process. It should find general application in selecting materials for x-ray optical elements such as masks, filters, windows where resistance to radiolysis is required as well as for photoresists where radiolytic sensitivity is necessary.
Publisher
Springer Science and Business Media LLC
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Peer Reviewed: Polymeric Microelectromechanical Systems.;Analytical Chemistry;2000-10-01
2. LITHOGRAPHY;Vacuum Ultraviolet Spectroscopy;1999
3. 10. Lithography;Experimental Methods in the Physical Sciences;1998