Abstract
AbstractEpitaxial regrowth of gold film on Si as a result of Au/Si eutectic reaction and epitaxial aluminum spikes forming at IC contacts during sintering have been investigated by transmission electron microscopy (TEM). For gold film on Si, three types of epitaxy were observed: (1) the crystal structures of the two lattices are exactly the same, (2) the two structures have the orientation relationship of Au(111)//Si(111) and Au[132]//Si[231] and (3) 20° misorientation from the relationship in (2). Two orientation relationships were observed in the case of Al spike in Si: (1) Al[011]//Si[123] and Al(200)//Si(11), (2) Al[001]//Si[112] and 2° misorientation between Al(200) and Si(111). Possible mechanisms are proposed to explained the observed epitaxial growth.
Publisher
Springer Science and Business Media LLC
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Semiconductor Contact Technology;Handbook of Semiconductor Interconnection Technology, Second Edition;2006-02-22