Gasdynamics and Chemistry in The Pulsed Laser Deposition of Oxide Dielectric Thin Films

Abstract

AbstractIn the context of “chemistry and its effects on film quality,” we and a number of other research groups have developed spectroscopic and modeling approaches to better define the pulsed laser deposition process. An overview of these approaches is given here, using the results of recent work performed in our laboratory on the oxide dielectric systems of BaTiO3 and PbZr0.53Ti0.47O3(PZT).