Author:
Yang Da,Jhaveri Shalin J.,Ober Christopher K.
Abstract
AbstractThe controlled formation of submicrometer-scale structures in three dimensions is of increasing interest in many applications. Not intended to produce the smallest structures, but instead aimed at complex topographies, two-photon lithography is an intrinsic 3D lithography technique that enables the fabrication of structures difficult to access by conventional single-photon processes with far greater spatial resolution than other 3D microfabrication techniques. By tightly focusing a femtosecond laser beam into a resin, subsequent photo-induced reactions such as polymerization occur only in the close vicinity of the focal point, allowing the fabrication of a 3D structure by directly writing 3D patterns. The current research effort in two-photon lithography is largely devoted to the design and synthesis of high-efficiency photoinitiators and sensitizers, as well as the development of new materials and systems. This article provides an overview of the progress in two-photon processes for the formation of complex images and the development of patterned structures.
Publisher
Springer Science and Business Media LLC
Subject
Physical and Theoretical Chemistry,Condensed Matter Physics,General Materials Science
Cited by
48 articles.
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