Author:
Obraztsov A.N.,Pavlovsky I.,Volkov A.P.,Kuznetsov V.L.,Chuvilin A.L.
Abstract
ABSTRACTOriented carbon nanotube films were grown using a method of chemical vapor deposition in hydrogen/methane plasma activated by glow discharge. The film phase composition and structural features were studied by Raman, SEM, TEM, and HRTEM techniques. Field emission properties of the films were examined to obtain I-V characteristics and the field emission site distribution. The I-V curves in Fowler-Nordheim coordinates were linear, that is typical for the field emission, with the threshold average field about 1.5 V/μm and the emission current density up to 50 mA/cm2 at the field of 5 V/μm. The emission site density reached 107 cm2 at the same value of electrtic field.
Publisher
Springer Science and Business Media LLC
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