Ge Related Defect-Complex Induced Luminescence in InGaAsP
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Published:1987
Issue:
Volume:104
Page:
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ISSN:0272-9172
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Container-title:MRS Proceedings
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language:en
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Short-container-title:MRS Proc.
Author:
Arora B. M.,Chakravarty S.,Chandvankar S. S.,Rajalakshmi R.,Srivastava A. K.
Abstract
ABSTRACTGermanium doping of InGaAsP epitaxial layers grown by liquid phase epitaxy produces n type conduction with a net distribution coefficient KGe∼ 5×10-3. In addition, Ge doping introduces a broad band (∼0.2eV) of efficient luminescence which is red shifted with respect to the band edge. The intensity of this band grows with increasing Ge concentration. In all the samples, the integrated intensity of the broad band varies relatively less in the temperature range 15K to about 90K. At higher temperatures, the intensity falls exponentially with an activation energy of 0.05 - 0.07 eV. The emission spectra are compared with the configuration-coordinate model of the emission from a Ge related complex.
Publisher
Springer Science and Business Media LLC
Subject
General Engineering
Reference10 articles.
1. 9. Chandvankar S.S. and Arora B.M. (Unpublished).
2. Preparation and characterization of LPE InP
Cited by
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