Author:
Rlickschloss M.,Landkammer B.,Ambacher O.,Vepřek S.
Abstract
ABSTRACTIntense photoluminescence has been obtained from nanocrystal-line silicon prepared in completely dry processing by the optimizing the crystallite size and the chemical passivation of the grain boundaries due to a controlled postoxidation of the plasma deposited films.
Publisher
Springer Science and Business Media LLC
Cited by
10 articles.
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