Fundamentals of Secondary Ion Mass Spectrometry-Reference-Cited by-同舟云学术

Fundamentals of Secondary Ion Mass Spectrometry

Published:1987-09 Issue:6 Volume:12 Page:40-47
ISSN:0883-7694
Container-title:MRS Bulletin
language:en
Short-container-title:MRS Bull.

Author:

Katz W.,Newman J.G.

Abstract

AbstractThis article presents an overview of our current understanding of the fundamental factors underlying Secondary Ion Mass Spectrometry (SIMS). Included is a discussion of the sputtering process and possible mechanisms which produce ejected ions. Presently available instrumentation for SIMS analysis is discussed and some examples of SIMS analysis are also given.

Publisher

Springer Science and Business Media LLC

Subject

Physical and Theoretical Chemistry,Condensed Matter Physics,General Materials Science

Reference28 articles.

1. Anisotropic emission in single crystal sputtering measurements on HCP single crystals

2. Multitechnique depth profiling of small molecules in polymeric matrixes

3. Evaluation of a cesium positive ion source for secondary ion mass spectrometry

4. Evaluation of a cesium positive ion source for secondary ion mass spectrometry

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