Studies of Ion-Assisted Growth and Properties of PbTe Epilayers Deposited by Rf Magnetron Sputtering

Abstract

ABSTRACT(111) PbTe // (111) BaF2 epilayers have been prepared by rf magnetron sputtering. A small negative substrate bias voltage (-10 V) enhances the (111) growth habit at reduced substrate temperatures (180 °C) and increased deposition rates (2.5 μ/h–1). Langmuir probe diagnostics is used to determine the energy and flux density of Ar ions incident on the growing film. Hall effect measurements are made to determine the carrier type and mobility as a function of the growth temperature.