Study of Amorphous to Microcrystalline Silicon Transition from Argon Diluted Silane

Author:

Gupta N. Dutta,Ray P. P.,Chaudhuri P.,Das U. K.,Vignoli S.,Jardin C.

Abstract

AbstractWe have studied the structural evolution in amorphous and microcrystalline silicon deposited from silane-argon mixture by radio frequency plasma enhanced chemical vapour deposition (PECVD) method. Sharp increase in small angle x-ray scattering (SAXS) intensity, in accordance with tilt measurements, indicates columnar morphology in the sample deposited in the amorphous-microcrystalline transition region. The variation of SAXS measured heterogeneity and a gradual shift of Si-H stretching vibrational frequency at 2000 cm-1 towards higher wave number with increase of power density indicate structural modifications in the films. Observation of sharp increase in the ratio of the intensity of Ar* to SiH* in the transition region may explain the surface modification assisted by Ar* and hence the structural changes in the material.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

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