PbTiO3 Thin Films by Chemical Beam Deposition-Reference-Cited by-同舟云学术

PbTiO3 Thin Films by Chemical Beam Deposition

Published:1990 Issue: Volume:200 Page:
ISSN:0272-9172
Container-title:MRS Proceedings
language:en
Short-container-title:MRS Proc.

Author:

Kingon A.I.,Hsieh K.Y.,King L.L.H.,Rou S.H.,Bachmann K.J.,Davis R.F.

Abstract

ABSTRACTThe feasibility of chemical beam deposition of PbTiO3 thin films is demonstrated. The method utilizes chemical (molecular) beams of metalorganic precursors in a high vacuum chamber. Pyrolysis reactions of the metalorganics at the substrate surface are facilitated by presence of active oxygen from an ozone source. Fine grained, smooth polycrystalline PbTiO3 films have been deposited at substrate temperatures as low as 325°C.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

Reference6 articles.

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5. Ferroelectric Memories

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