Author:
Etzold K. F.,Roy R. A.,Saenger K. L.
Abstract
AbstractIn this study we report on in-situ growth of lead zirconate titanate (PbZr1-xTixO3, PZT) and strontium titanate (SrTiO3, STO) films by pulsed laser deposition at 248 nm. Films were deposited in an oxygen background at elevated temperatures on a variety of substrates including MgO(l00), Pt(100)/MgO(100), Pt(111)/MgO(111), Pt(110)/MgO(110), Pt(111)/SiO2/Si, and Pt(111)/glass.Deposited films were characterized by Rutherford Backscattering Spectroscopy (RBS), x-ray diffraction (XRD), and electrical (dielectric constant and leakage) measurements. A strong substrate dependence was found for both the fraction of pyrochlore (Pb2Zr2-xTixO7) phase in the PZT films, and the STO film dielectric constants. The origin of the substrate dependence is discussed with regard to nucleation and interface layer cffects, and the chemistry of the relevant materials.
Publisher
Springer Science and Business Media LLC
Cited by
7 articles.
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