Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices-Reference-Cited by-同舟云学术

Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices

Published:2016-01-20 Issue:1 Volume:9 Page:63
ISSN:1996-1944
Container-title:Materials
language:en
Short-container-title:Materials

Author:

Gwamuri Jephias,Marikkannan Murugesan,Mayandi Jeyanthinath,Bowen Patrick,Pearce Joshua

Funder

National Science Foundation

Publisher

MDPI AG

Subject

General Materials Science

Link

http://www.mdpi.com/1996-1944/9/1/63/pdf

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