Properties of SiCN Films Relevant to Dental Implant Applications

Author:

Xia Xinyi1,Chiang Chao-Ching1ORCID,Gopalakrishnan Sarathy K.1,Kulkarni Aniruddha V.1,Ren Fan1ORCID,Ziegler Kirk J.1,Esquivel-Upshaw Josephine F.2ORCID

Affiliation:

1. Department of Chemical Engineering, College of Engineering, University of Florida, Gainesville, FL 32611, USA

2. Department of Restorative Dental Sciences, Division of Prosthodontics, College of Dentistry, University of Florida, Gainesville, FL 32610, USA

Abstract

The application of surface coatings is a popular technique to improve the performance of materials used for medical and dental implants. Ternary silicon carbon nitride (SiCN), obtained by introducing nitrogen into SiC, has attracted significant interest due to its potential advantages. This study investigated the properties of SiCN films deposited via PECVD for dental implant coatings. Chemical composition, optical, and tribological properties were analyzed by adjusting the gas flow rates of NH3, CH4, and SiH4. The results indicated that an increase in the NH3 flow rate led to higher deposition rates, scaling from 5.7 nm/min at an NH3 flow rate of 2 sccm to 7 nm/min at an NH3 flow rate of 8 sccm. Concurrently, the formation of N-Si bonds was observed. The films with a higher nitrogen content exhibited lower refractive indices, diminishing from 2.5 to 2.3 as the NH3 flow rate increased from 2 sccm to 8 sccm. The contact angle of SiCN films had minimal differences, while the corrosion rate was dependent on the pH of the environment. These findings contribute to a better understanding of the properties and potential applications of SiCN films for use in dental implants.

Funder

NIH-NIDCR

Publisher

MDPI AG

Subject

General Materials Science

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