Spectroscopic Ellipsometry: Advancements, Applications and Future Prospects in Optical Characterization

Abstract

Spectroscopic ellipsometry (SE), a non-invasive optical technique, is a powerful tool for characterizing surfaces, interfaces, and thin films. By analyzing the change in the polarization state of light upon reflection or transmission through a sample, ellipsometry provides essential parameters such as thin film thickness (t) and optical constants (n, k). This review article discusses the principles of ellipsometry, including the measurement of key values ∆ and Ψ, and the complex quantity ρ. The article also presents the Fresnel equations for s and p polarizations and the importance of oblique angles of incidence in ellipsometry. Data analysis in ellipsometry is explored, including the determination of bandgap and data referencing the electrical properties of materials. The article emphasizes the importance of choosing the appropriate models to fit ellipsometric data accurately, with examples of the Cauchy and Lorentz models. Additionally, the Kramers–Kronig relations are introduced, illustrating the connection between real and imaginary components of optical constants. The review underscores the significance of ellipsometry as a non-destructive and versatile technique for material characterization across a wide range of applications.