Photo-Generation of Tunable Microwave Carriers at 2 µm Wavelengths Using Double Sideband with Carrier Suppression Modulation
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Published:2022-03-20
Issue:6
Volume:12
Page:3172
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ISSN:2076-3417
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Container-title:Applied Sciences
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language:en
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Short-container-title:Applied Sciences
Author:
Ji Di,Hu Zhitao,Ye Nan,Pang Fufei,Song Yingxiong
Abstract
At 2 µm wavelengths (149.9 THz), hollow-core photonics band gap fibers have higher light power damage thresholds, stable polarization states, and lower losses of 0.1 dB/km. Additionally, a thulium-doped fiber amplifier can provide a gain of >35 dB. Specifically, an indium-rich InGaAs photodetector shows a naturally higher photoresponsivity at 2 µm wavelengths than the C-band. Therefore, using tunable photo-generated microwave technology at 2 µm wavelengths could achieve higher photo-to-electric power conversion efficiencies for higher RF output power applications using the same method at the same frequency. Here, a double sideband with the carrier suppression modulation method was experimentally applied on 2 µm wavelengths to generate tunable and stable microwave carriers. Comparison experiments were also applied on the 1.55 µm (193.4 THz)/1.31 µm wavelengths (228.8 THz) based on the same indium-rich InGaAs photodetector. Through normalization on the wavelength-corresponded squared external quantum efficiency to visualize the photo-to-electric power conversion efficiency at different wavelengths under the same input optical signal power, the ratio between the results at 2 µm wavelengths and C/O-band is abstracted as 1.31/1.98, approaching theoretical estimations. This corresponds to a power conversion efficiency increasement of ~1.16 dB/~2.98 dB. To our knowledge, this is the first study on 2 micron wavelengths that proves the corresponding high efficiency power conversion property.
Funder
National Key Research and Development Program of China
Natural Science Foundation of China
111 project
STCSM
the National Natural Science Foundation of China
Subject
Fluid Flow and Transfer Processes,Computer Science Applications,Process Chemistry and Technology,General Engineering,Instrumentation,General Materials Science