Influence of Approaching Excavation on Adjacent Segments for Twin Tunnels

Author:

Li Shaohua,Li Pengfei,Zhang Mingju,Liu Yi

Abstract

This paper aims at influence analysis of approaching excavation on adjacent segments for twin tunnels with variable clear spacing located in Beijing, China. A series of numerical simulations have been conducted to investigate the influence of approaching excavation on ground displacements and mechanical responses of segments. What’s more, on-site monitoring was conducted at the position of the minimum spacing between the twin tunnels. It is found that the deformation of the measured segment presents a pronounced asymmetric ovalization when the second tunnel approaches the measured cross-section. During the approaching excavation of the second tunnel, the normal force increases gradually, whereas the bending moment first decreases and then increases. The maximum increments of internal forces in the measured segment are both located at the regions near the second tunnel, in which the springline and shoulder of the segment are mainly subject to the effect of the circumferential compression and axial tension. The approaching excavation reduces the horizontal displacements of the ground between twin tunnels and increases the ground settlements as well as the horizontal displacements of the ground on both sides. The actual tunneling case of first along the curved trajectory and then along the straight-line trajectory can reduce internal forces of the segment.

Publisher

MDPI AG

Subject

Fluid Flow and Transfer Processes,Computer Science Applications,Process Chemistry and Technology,General Engineering,Instrumentation,General Materials Science

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3