Plasma-Chemical Disposal of Silicon and Germanium Tetrachlorides Waste by Hydrogen Reduction

Author:

Kornev Roman12,Gornushkin Igor3,Shabarova Lubov14,Kadomtseva Alena5,Mochalov Georgy2,Rekunov Nikita2ORCID,Romanov Sergey2,Medov Vitaly2ORCID,Belousova Darya2,Maleev Nikita2

Affiliation:

1. Institute of Chemistry and High-Purity Substances Named after G.G. Devyatykh, Russian Academy of Sciences, Tropinina, 49, 603951 Nizhny Novgorod, Russia

2. Department of Nanotechnology and Biotechnology, R.E. Alekseev Nizhny Novgorod Technical University, Minin St., 24, 603155 Nizhny Novgorod, Russia

3. BAM Federal Institute for Materials Research and Testing, Richard-Willstätter-Strasse 11, 12489 Berlin, Germany

4. Department of Applied Mathematics, National Research Lobachevsky State University of Nizhny Novgorod, Prospekt Gagarina 23, 603022 Nizhny Novgorod, Russia

5. Department of General Chemistry, Privolzhsky Research Medical University, Minina and Pozharskogo Square 10/1, 603005 Nizhny Novgorod, Russia

Abstract

The processes of hydrogen reduction of silicon and germanium chlorides under the conditions of high-frequency (40.68 MHz) counteracted arc discharge stabilized between two rod electrodes are investigated. The main gas-phase and solid products of plasma-chemical transformations are determined. Thermodynamic analysis of SiCl4 + H2 and GeCl4 + H2 systems for optimal process parameters was carried out. Using the example of hydrogen reduction of SiCl4 by the method of numerical modeling, gas-dynamic and thermal processes for this type of discharge are investigated. The impurity composition of gas-phase and solid reaction products is investigated. The possibility of single-stage production of high-purity Si and Ge mainly in the form of compact ingots, as well as high-purity chlorosilanes and trichlorogermane, is shown.

Publisher

MDPI AG

Subject

Multidisciplinary

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