Response Time of a Thin-Film Resistance Temperature Detector (RTD) for High-Intensity Focused Ultrasound (HIFU) Phantom Applications

Author:

Lequiron Ma. Stella Grace B.12ORCID,Joe Daniel J.1ORCID,Lim Sun Do3ORCID,Doh Il12

Affiliation:

1. Safety Measurement Institute, Korea Research Institute of Standards and Science (KRISS), Daejeon 34113, Republic of Korea

2. Department of Applied Measurement Science, University of Science and Technology (UST), Daejeon 34113, Republic of Korea

3. Photometry and Radiometry Group, Division of Physical Metrology, Korea Research Institute of Standards and Science (KRISS), Daejeon 34113, Republic of Korea

Abstract

The thermal response time of a thin-film resistance temperature detector (RTD) array sensor was measured for a high-intensity focused ultrasound (HIFU) phantom. As the temperature inside materials change rapidly within several seconds, it is important to have a temperature sensor with a fast response time to evaluate their performance. However, previous methods for measuring thermal response time were not suitable for thin-film sensors, and there were no quantitative data available. In this study, we used a liquid drop method to measure the thermal time constant of the thin-film RTD, which was found to be 1.0 ± 0.2 ms. This indicates that the thin-film RTD array sensor has a sufficiently fast response time to detect sudden temperature changes inside the tissue-mimicking material (TMM) for validating HIFU devices.

Funder

Korea Research Institute of Standards and Science

Ministry of Trade, Industry, and Energy, the Ministry of Health and Welfare, Republic of Korea, and the Ministry of Food and Drug Safety

Ministry of Science and ICT

Publisher

MDPI AG

Subject

Fluid Flow and Transfer Processes,Computer Science Applications,Process Chemistry and Technology,General Engineering,Instrumentation,General Materials Science

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