Solution Plasma for Surface Design of Advanced Photocatalysts

Author:

Wang Rui1,Wang Changhua1,Xing Yanmei1,Zhang Xintong1

Affiliation:

1. Key Laboratory of UV-Emitting Materials and Technology of Chinese Ministry of Education, Northeast Normal University, 5268 Renmin Street, Changchun 130024, China

Abstract

Rational design of the surface of photocatalysts can conveniently modulate the photo-stimulated charge separation, influence the surface reaction kinetics, and other pivotal factors in the photocatalytic processes for efficient photocatalysis. Solution plasma, holding promise for mild modification of the surface structure of materials, has recently been recognized as an emerging technology for surface engineering of high-performance photocatalysts. In this review, we will briefly introduce the fundamentals of solution plasma and its applications in materials preparation and summarize the recent research progress in the surface design of advanced photocatalysts by solution plasma. Lastly, we will indicate some possible new directions. This review is expected to provide an instructive guideline for the surface design of heterogeneous photocatalysts by solution plasma.

Funder

National Natural Science Foundation of China

Jilin Province Science and Technology Development Project

Publisher

MDPI AG

Subject

Physical and Theoretical Chemistry,Catalysis,General Environmental Science

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