Concurrent Control Chart Pattern  Recognition: A Systematic Review

Author:

García EthelORCID,Peñabaena-Niebles RitaORCID,Jubiz-Diaz MariaORCID,Perez-Tafur Angie

Abstract

The application of statistical methods to monitor a process is critical to ensure its stability. Statistical process control aims to detect and identify abnormal patterns that disrupt the natural behaviour of a process. Most studies in the literature are focused on recognising single abnormal patterns. However, in many industrial processes, more than one unusual control chart pattern may appear simultaneously, i.e., concurrent control chart patterns (CCP). Therefore, this paper aims to present a classification framework based on categories to systematically organise and analyse the existing literature regarding concurrent CCP recognition to provide a concise summary of the developments performed so far and a helpful guide for future research. The search only included journal articles and proceedings in the area. The literature search was conducted using Web of Science and Scopus databases. As a result, 41 studies were considered for the proposed classification scheme. It consists of categories designed to assure an in-depth analysis of the most relevant topics in this research area. Results concluded a lack of research in this research field. The main findings include the use of machine learning methods; the study of non-normally distributed processes; and the consideration of abnormal patterns different from the shift, trend, and cycle behaviours.

Publisher

MDPI AG

Subject

General Mathematics,Engineering (miscellaneous),Computer Science (miscellaneous)

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