Optimization of Magnetic Tunnel Junction Structure through Component Analysis and Deposition Parameters Adjustment

Author:

Ghemes Crina1,Tibu Mihai1,Dragos-Pinzaru Oana-Georgiana1,Ababei Gabriel1ORCID,Stoian George1ORCID,Lupu Nicoleta1ORCID,Chiriac Horia1

Affiliation:

1. National Institute of Research and Development for Technical Physics, 700050 Iasi, Romania

Abstract

In this work, we focus on a detailed study of the role of each component layer in the multilayer structure of a magnetic tunnel junction (MTJ) as well as the analysis of the effects that the deposition parameters of the thin films have on the performance of the structure. Various techniques including atomic force microscopy (AFM), scanning electron microscopy (SEM), and transmission electron microscopy (TEM) were used to investigate the effects of deposition parameters on the surface roughness and thickness of individual layers within the MTJ structure. Furthermore, this study investigates the influence of thin films thickness on the magnetoresistive properties of the MTJ structure, focusing on the free ferromagnetic layer and the barrier layer (MgO). Through systematic analysis and optimization of the deposition parameters, this study demonstrates a significant improvement in the tunnel magnetoresistance (TMR) of the MTJ structure of 10% on average, highlighting the importance of precise control over thin films properties for enhancing device performance.

Publisher

MDPI AG

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