Intergranular Spin Dependent Tunneling Dominated Magnetoresistance in Helimagnetic Manganese Phosphide Thin Films

Author:

Muchharla Baleeswaraiah1ORCID,Madhogaria Richa Pokharel1,Detellem Derick1,Hung Chang-Ming1ORCID,Chanda Amit1ORCID,Mudiyanselage Nivarthana W. Y. A. Y.1,Duong Anh Tuan23,Trinh Minh-Tuan4,Witanachchi Sarath1,Phan Manh-Huong1

Affiliation:

1. Department of Physics, University of South Florida, Tampa, FL 33620, USA

2. Faculty of Materials Science and Engineering, Phenikaa University, Hanoi 12116, Vietnam

3. Phenikaa Research and Technology Institute (PRATI), A&A Green Phoenix Group, 167 Hoang Ngan, Hanoi 13313, Vietnam

4. Department of Chemistry and Biochemistry, Utah State University, Logan, UT 84322, USA

Abstract

Helical magnets are emerging as a novel class of materials for spintronics and sensor applications; however, research on their charge- and spin-transport properties in a thin film form is less explored. Herein, we report the temperature and magnetic field-dependent charge transport properties of a highly crystalline MnP nanorod thin film over a wide temperature range (2 K < T < 350 K). The MnP nanorod films of ~100 nm thickness were grown on Si substrates at 500 °C using molecular beam epitaxy. The temperature-dependent resistivity ρ(T) data exhibit a metallic behavior (dρ/dT > 0) over the entire measured temperature range. However, large negative magnetoresistance (Δρ/ρ) of up to 12% is observed below ~50 K at which the system enters a stable helical (screw) magnetic state. In this temperature regime, the Δρ(H)/ρ(0) dependence also shows a magnetic field-manipulated CONE + FAN phase coexistence. The observed magnetoresistance is dominantly governed by the intergranular spin dependent tunneling mechanism. These findings pinpoint a correlation between the transport and magnetism in this helimagnetic system.

Funder

US Department of Energy, Office of Basic Energy Sciences, Division of Materials Science and Engineering

Publisher

MDPI AG

Subject

General Materials Science,General Chemical Engineering

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