Modeling and Manufacturing of a Micromachined Magnetic Sensor Using the CMOS Process without Any Post-Process-Reference-Cited by-同舟云学术

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Modeling and Manufacturing of a Micromachined Magnetic Sensor Using the CMOS Process without Any Post-Process

Published:2014-04-11 Issue:4 Volume:14 Page:6722-6733
ISSN:1424-8220
Container-title:Sensors
language:en
Short-container-title:Sensors

Author:

Tseng Jian-Zhi,Wu Chyan-Chyi,Dai Ching-Liang

Publisher

MDPI AG

Subject

Electrical and Electronic Engineering,Biochemistry,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Link

http://www.mdpi.com/1424-8220/14/4/6722/pdf

Reference30 articles.

1. Microsensors MEMS and Smart Devices;Gardner,2001

2. Giant magneto-transistor thin film magnetic sensor;Nazarinejad;IEEE Trans. Magnet.,2013

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1. Design and Measurement of Microelectromechanical Three-Axis Magnetic Field Sensors Based on the CMOS Technique;Micromachines;2023-05-12

2. Manufacturing and Characterization of Three-Axis Magnetic Sensors Using the Standard 180 nm CMOS Technology;Sensors;2021-10-20

3. Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process;Micromachines;2018-08-07

4. A Three-Axis Magnetic Field Microsensor Fabricated Utilizing a CMOS Process;Applied Sciences;2017-12-11

5. A 3-Axis Miniature Magnetic Sensor Based on a Planar Fluxgate Magnetometer with an Orthogonal Fluxguide;Sensors;2015-06-19

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