Magnetron Sputtered Al Co-Doped with Zr-Fe2O3 Photoanode with Fortuitous Al2O3 Passivation Layer to Lower the Onset Potential for Photoelectrochemical Solar Water Splitting

Abstract

In this paper, we investigate the magnetron sputtering deposition of an Al-layer on Zr-doped FeOOH (Zr-FeOOH) samples to fabricate a Zr/Al co-doped Fe2O3 (Al-Zr/HT) photoanode. An Al-layer is deposited onto Zr-FeOOH through magnetron sputtering and the thickness of the Al deposition is regulated by differing the sputtering time. Electrochemical impedance spectroscopy, intensity-modulated photocurrent spectroscopy, Mott-Schottky and time-resolved photoluminescence spectra analyses were used to study, in depth, the correlations between sputtered Al-layer thicknesses and PEC characteristics. High-temperature quenching (800 °C) assists in diffusing the Al3+ in the bulk of the Zr-doped Fe2O3 photoanode, whilst an unintended Al2O3 passivation layer forms on the surface. The optimized Al-Zr/HT photoelectrode achieved 0.945 mA/cm2 at 1.0 VRHE, which is 3-fold higher than that of the bare Zr/HT photoanode. The Al2O3 passivation layer causes a 100 mV cathodic shift in the onset potential. Al co-doping improved the donor density, thus reducing the electron transit time. In addition, the passivation effect of the Al2O3 layer ameliorated the surface charge transfer kinetics. The Al2O3 passivation layer suppressed the surface charge transfer resistance, consequently expediting the hole migration from photoanode to electrolyte. We believe that the thickness-controlled Al-layer sputtering approach could be applicable for various metal oxide photoanodes to lower the onset potential.