Morphological Transition in Diamond Thin-Films Induced by Boron in a Microwave Plasma Deposition Process
Author:
Funder
NASA
Publisher
MDPI AG
Subject
General Materials Science
Link
http://www.mdpi.com/1996-1944/10/11/1305/pdf
Reference16 articles.
1. Rapid Growth of Nanostructured Diamond Film on Silicon and Ti–6Al–4V Alloy Substrates
2. Modeling of nitrogen/diborane/methane/hydrogen plasma for nanocrystalline diamond growth: Comparison with experimental data
3. The nature of the acceptor centre in semiconducting diamond
4. Influence of boron carbide on properties of CVD-diamond thin films at various deposition pressures
5. Metal-insulator transition and superconductivity in boron-doped diamond
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