Ultra-High Vacuum Cells Realized by Miniature Ion Pump Using High-Efficiency Plasma Source

Author:

Kurashima Yuichi1ORCID,Maeda Atsuhiko1,Oshima Naoto2,Motomura Taisei3ORCID,Matsumae Takashi1ORCID,Watanabe Mitsuhiro2,Takagi Hideki1ORCID

Affiliation:

1. Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba 305-8564, Japan

2. College of Science and Technology, Nihon University, Funabashi 274-8501, Japan

3. Sensing System Research Center, National Institute of Advanced Industrial Science and Technology, Tosu 841-0052, Japan

Abstract

In recent years, there has been significant interest in quantum technology, characterized by the emergence of quantum computers boasting immense processing power, ultra-sensitive quantum sensors, and ultra-precise atomic clocks. Miniaturization of quantum devices using cold atoms necessitates the employment of an ultra-high vacuum miniature cell with a pressure of approximately 10−6 Pa or even lower. In this study, we developed an ultra-high vacuum cell realized by a miniature ion pump using a high-efficiency plasma source. Initially, an unsealed miniature ion pump was introduced into a vacuum chamber, after which the ion pump’s discharge current, depending on vacuum pressures, was evaluated. Subsequently, a miniature vacuum cell was fabricated by hermetically sealing the miniature vacuum pump. The cell was successfully evacuated by a miniature ion pump down to an ultra-high vacuum region, which was derived by the measured discharge current. Our findings demonstrate the feasibility of achieving an ultra-high vacuum cell necessary for the operation of miniature quantum devices.

Funder

Innovative Science and Technology Initiative for Security

Publisher

MDPI AG

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