Vital Role of Synthesis Temperature in Co–Cu Layered Hydroxides and Their Fenton-like Activity for RhB Degradation

Author:

Zhang Ruixue,Liu Yanping,Jiang Xinke,Meng Bo

Abstract

Cu and Co have shown superior catalytic performance to other transitional elements, and layered double hydroxides (LDHs) have presented advantages over other heterogeneous Fenton catalysts. However, there have been few studies about Co–Cu LDHs as catalysts for organic degradation via the Fenton reaction. Here, we prepared a series of Co–Cu LDH catalysts by a co-precipitation method under different synthesis temperatures and set Rhodamine B (RhB) as the target compound. The structure-performance relationship and the influence of reaction parameters were explored. A study of the Fenton-like reaction was conducted over Co–Cu layered hydroxide catalysts, and the variation of synthesis temperature greatly influenced their Fenton-like catalytic performance. The Co–Cut=65°C catalyst with the strongest LDH structure showed the highest RhB removal efficiency (99.3% within 30 min). The change of synthesis temperature induced bulk-phase transformation, structural distortion, and metal–oxygen (M–O) modification. An appropriate temperature improved LDH formation with defect sites and lengthened M–O bonds. Co–Cu LDH catalysts with a higher concentration of defect sites promoted surface hydroxide formation for H2O2 adsorption. These oxygen vacancies (Ovs) promoted electron transfer and H2O2 dissociation. Thus, the Co–Cu LDH catalyst is an attractive alternative organic pollutants treatment.

Publisher

MDPI AG

Subject

Physical and Theoretical Chemistry,Catalysis,General Environmental Science

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3