222-Nanometer Far-UVC Exposure Results in DNA Damage and Transcriptional Changes to Mammalian Cells

Author:

Ong QunxiangORCID,Wee WinsonORCID,Dela Cruz Joshua,Teo Jin Wah Ronnie,Han Weiping

Abstract

Ultraviolet (UV) germicidal tools have recently gained attention as a disinfection strategy against the COVID-19 pandemic, but the safety profile arising from their exposure has been controversial and impeded larger-scale implementation. We compare the emerging 222-nanometer far UVC and 277-nanometer UVC LED disinfection modules with the traditional UVC mercury lamp emitting at 254 nm to understand their effects on human retinal cell line ARPE-19 and HEK-A keratinocytes. Cells illuminated with 222-nanometer far UVC survived, while those treated with 254-nanometer and 277-nanometer wavelengths underwent apoptosis via the JNK/ATF2 pathway. However, cells exposed to 222-nanometer far UVC presented the highest degree of DNA damage as evidenced by yH2AX staining. Globally, these cells displayed transcriptional changes in cell-cycle and senescence pathways. Thus, the introduction of 222-nanometer far UVC lamps for disinfection purposes should be carefully considered and designed with the inherent dangers involved.

Funder

National Research Foundation

Accelerate Technologies

Publisher

MDPI AG

Subject

Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry,Computer Science Applications,Spectroscopy,Molecular Biology,General Medicine,Catalysis

Reference27 articles.

1. The Mammalian UV Response

2. Ultraviolet light-induced DNA damage triggers apoptosis in nucleotide excision repair-deficient cells via Bcl-2 decline and caspase-3/-8 activation

3. Quantitative Assessment of UV-Induced Pigmentation and Erythema;Kollias;Photodermatol,1988

4. The epidemiology of UV induced skin cancer

5. Development and Repair of Cataract Induced by Ultraviolet Radiation—ProQuest https://www.proquest.com/openview/4ee61a6faf429bda7bf10549a195b1e6/1?cbl=2026366&diss=y&pq-origsite=gscholar

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