The Influence of the ITO Layers’ Thicknesses on Their Chosen Physical Surface Parameters

Author:

Musztyfaga-Staszuk Małgorzata1ORCID,Gawlińska-Nęcek Katarzyna2ORCID,Socha Robert3ORCID,Panek Piotr2

Affiliation:

1. Welding Department, Silesian University of Technology, Konarskiego 18A, 44-100 Gliwice, Poland

2. Institute of Metallurgy and Materials Science PAS, Reymonta 25, 30-059 Krakow, Poland

3. Centrum Badań i Rozwoju Technologii dla Przemysłu S.A., Waryńskiego 3A, 00-645 Warszawa, Poland

Abstract

The paper presents the results concerning the influence of the thickness of the ITO and In2O3 layers deposited by the magnetron sputtering method on the physical parameters characterising their surface properties. The characterisation parameters were obtained by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and Kelvin probe. The increase in the layers’ thickness related to the time of their fabrication causes an increase in the surface roughness and the value of the work function, followed by a decrease in the concentration of elements and compounds in the near-surface area.

Funder

Silesian University of Technology

Publisher

MDPI AG

Subject

General Materials Science

Reference31 articles.

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