An Improved Hidden Markov Model for Monitoring the Process with Autocorrelated Observations

Author:

Li Yaping,Li Haiyan,Chen Zhen,Zhu Ying

Abstract

With the development of intelligent manufacturing, automated data acquisition techniques are widely used. The autocorrelations between data that are collected from production processes have become more common. Residual charts are a good approach to monitoring the process with data autocorrelation. An improved hidden Markov model (IHMM) for the prediction of autocorrelated observations and a new expectation maximization (EM) algorithm is proposed. A residual chart based on IHMM is employed to monitor the autocorrelated process. The numerical experiment shows that, in general, IHMMs outperform both conventional hidden Markov models (HMMs) and autoregressive (AR) models in quality shift diagnosis, decreasing the cost of missing alarms. Moreover, the times taken by IHMMs for training and prediction are found to be much less than those of HMMs.

Publisher

MDPI AG

Subject

Energy (miscellaneous),Energy Engineering and Power Technology,Renewable Energy, Sustainability and the Environment,Electrical and Electronic Engineering,Control and Optimization,Engineering (miscellaneous)

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