Study on the Duration of Laser-Induced Thin Film Plasma Flash

Abstract

The accuracy of judging whether the film is damaged directly affects the accuracy of the measurement of the film laser damage threshold. When judging the film damage by the traditional plasma flash method, there is a problem of misjudgment caused by the failure to distinguish the film and air plasma flash. In order to eliminate misjudgment, the two flashes are accurately distinguished by the difference in the duration of the air and film plasma flash. This paper aims to obtain the theoretical and experimental values of the duration of the film plasma flash (tf) and analyze the factors affecting it. Firstly, taking single-layer hafnium oxide and aluminum oxide thin films as examples, when the wavelength of the incident laser is 1064 nm, the diameter of the laser focusing spot is 0.08 cm, the energy of the incident laser is 100 mJ, and the pulse width of incident laser is 10 ns, the tf of hafnium oxide, and aluminum oxide thin films are 542.7 and 299.6 ns, respectively. Secondly, the experimental study of tf was carried out. Through six experiments, the following results were obtained: (1) With the increase in incident laser energy, the tf of both films increases; (2) The tf of the hafnium oxide film is longer than that of the aluminum oxide film. (3) The experimental parameters are put into the calculation model, and the theoretical results are in good agreement with the experimental tf values. Finally, it is found that tf increases with the increase in incident laser energy and incident laser pulse width, and decreases with the increase in focusing spot diameter.