Affiliation:
1. National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Street, 077125 Magurele, Romania
Abstract
The thermionic vacuum discharge method is very effective in that the films obtained using this technology are characterised by a very high degree of adhesion, density and purity because the deposition technique is carried out in high, very high or, if possible, in ultra-very high vacuum conditions with no gas present. When the substrate is placed in vacuum, no heat transfer particles are present, the substrate being heated only by the ion incident on the surface. This advantage recommends the TVD method for deposits on plastics or other thermally sensitive materials. Additionally, this slow heat transfer reduces energy loss, making the deposition method industrially competitive. The paper aims to present theoretical aspects of this type of discharge, compared to typical or more popular plasmas but also to present the achievements of this method and its utility in the thin films production, layers that have specific imposed properties. The practical depositions and applications presented are in the nuclear fusion-related material science and also for obtaining materials for granular structures, used as magneto-resistive coatings.
Funder
National Authority for Research and Innovation
Romanian Ministry of Research, Innovation and Digitalization
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces
Reference111 articles.
1. Badareu, E., and Popescu, I.I. (1965). Ionized Gases, Editura Tehnica. (In Romanian).
2. van der Ziel, A. (1957). Solid State Physical Elrctronics, Prentice Hall Inc.
3. Kittel, C. (1953). Introduction to Solid State Physics, Wiley.
4. Nottingham, W.B.H. (1956). Electron Emission, Gasentladunge 1. PH 21, Springer.
5. Moijes, B.I., and Pikus, G.E. (1973). Thermoeission Convertors & Low Temperature Plasma, Izd. Nauka. (In Russian).
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献