Tunable Plasmonic Resonances in TiN Nanorod Arrays

Abstract

In this work, titanium nitride (TiN) nanorod arrays were fabricated using glancing angle deposition in a magnetron sputtering system. The deposition parameters, including the bias on the substrate and the flow rate of nitrogen, were varied to deposit various TiN nanorod arrays. Before glancing angle deposition was conducted, uniform TiN films were deposited and their permittivity spectra, for various deposition parameters, were obtained. The effect of the deposition parameters on the morphology of the nanorods is analyzed here. The polarization-dependent extinctance spectra of TiN nanorod arrays were measured and compared. Extinction, which corresponds to the longitudinal mode of localized surface plasmon resonance, can be significantly changed by tuning the N2 flow rate and substrate bias voltage during deposition.