High Temperature Anti-Friction Behaviors of a-Si:H Films and Counterface Material Selection

Abstract

In the present paper, the influence of self-mated friction materials on the tribological properties of hydrogenated amorphous silicon films (a-Si:H films) is studied systemically at high temperature. The results are obtained by comparing the tribological properties of a-Si:H films under different friction pair materials and temperatures. The a-Si:H films exhibit super-low friction of 0.07 at a temperature of 600 °C, and ceramic materials are appropriate for anti-friction behaviors of a-Si:H films at high temperature. The results of tribotests and observations of the fundamental friction mechanism show that super-low friction of a-Si:H films and ceramic materials of the friction system are involved in high temperature oxidation; this also applies to the tribochemical reactions of a-Si:H films, steel and iron silicate in open air at elevated temperature in the friction process.