Spectrophotometric Characterization of Thin Semi-Transparent Aluminum Films Prepared by Electron Beam Evaporation and Magnetron Sputtering

Abstract

Aluminum thin films with thicknesses between approximately 10 and 60 nm have been deposited by evaporation and sputtering techniques. Layer characterization focused on reflectance, optical constants, and surface quality. Reflectance fits have been performed using a merger of three standard dispersion models, namely the Drude model, the Lorentzian oscillator model, and the beta-distributed oscillator model. A thickness dependence of the optical constants could be established in the investigated thickness range.