Study of Cu Content Reference Materials Used in AlCu Films for X-ray Energy/Wavelength-Dispersive Spectrometer Calibration

Author:

Li Xiao1,Zhang Ran23,Tian Donghui2ORCID,Cui Lei4,Zhang Yi5,Li Xu2ORCID,Lai Yuming1,Wang Yalei4

Affiliation:

1. National Center for Materials Service Safety, University of Science and Technology Beijing, Beijing 100083, China

2. Center for Advanced Measurement Science, National Institute of Metrology, Beijing 100029, China

3. Department of Electrical and Electronic Engineering, Southern University of Science and Technology, Shenzhen 518055, China

4. Nanjing Institute of Measurement and Testing Technology, Nanjing 210049, China

5. School of Materials Science and Engineering, Henan University of Science and Technology, Luoyang 471023, China

Abstract

Calibration is one of the most important factors affecting the measurement accuracy of X-ray energy/wavelength-dispersive spectrometers (EDS/WDSs). In this work, three Cu content reference materials used in AlCu films for X-ray EDS/WDS calibration are prepared using magnetron sputtering deposition. The Cu content standard values of the three reference materials are determined using an inductively coupled plasma optical emission spectrometer (ICP-OES) and the uncertainties of the reference materials are evaluated. The results show that the homogeneity and stability of the three Cu content reference materials used in AlCu films meet the requirements. The Cu content standard values of the three reference materials are 2.56%, 14.64%, and 49.46% (mass fraction), respectively. Their extended uncertainties are 0.14%, 0.42%, and 0.98% (k = 2), respectively. Using quantitative analysis, it was determined that the three developed reference materials meet the calibration requirements of X-ray EDS/WDS, thus guaranteeing the accuracy and consistency of the measurement results.

Funder

Fundamental Research Funds for the Central Universities

Youth Program of the National Natural Science Foundation of China

Publisher

MDPI AG

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces

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