Analytical Model of the Process of Thermal Barrier Coating by the MO CVD Method

Abstract

Integral regularities in the growth of 7YSZ thermal barrier coatings during MO CVD (Metal–Organic Chemical Vapor Deposition) are proposed. Within the framework of the model of the reacting boundary layer, the coating deposition process is considered as a process of independent global reactions of diffusion combustion of Zr(dpm)4 and Y(dpm)3 under convection conditions on a permeable surface. The rate of coating growth and the efficiency of using a precursor are analytically evaluated. The correctness of the proposed approach is confirmed by comparison with known experimental data. The considered model can be used to analyze the deposition of coatings from various mixtures of precursors, such as Nd(dpm)3, Hf(dpm)4, and Sm(dpm)3.