Effect of Target Sintering Temperature on the Morphological and Optical Properties of Pulsed Laser Deposited TiO2 Thin Films

Abstract

In this paper, we report on the effect of titanium dioxide (TiO2) target sintering temperature on the morphological and optical properties of amorphous titanium dioxide thin films synthesized by pulsed laser deposition (PLD) on indium tin oxide (ITO) glass substrate and subsequently heat-treated in air at low temperature (150 °C). Three types of targets were used, unsintered (pressed at room temperature), sintered at 500 °C and sintered at 1000 °C. The surface morphology of the samples was investigated by scanning electron microscopy (SEM), and profilometry was used for thickness measurements. The structural properties of the films were examined by X-ray diffraction (XRD), while their optical properties were studied by UV‒vis spectroscopy. The obtained TiO2 thin films have an amorphous nature, as shown by XRD analysis. Profilometer showed that sintered target samples have more reliable thicknesses than unsintered ones. The SEM studies revealed the sufficient structural homogeneity of sintered target nanosized TiO2 films and agglomerates in the case of unsintered target film. The UV‒vis transmittance spectra showed high transparency in the visible range of PLD films, proportional to the target sintering temperature. The optical band gaps of the films deposited using the 500 °C and 1000 °C sintered targets are closer to those of anatase and rutile phases, respectively, which provides a promising approach to the challenges of amorphous TiO2-based nanostructures.