Oxidation Resistance of Ir/HfO2 Composite Coating Prepared by Chemical Vapor Deposition: Microstructure and Elemental Migration

Abstract

In this study, a HfO2 coating was developed on an Ir matrix using a customized open-tube airflow, cold-wall chemical vapor deposition instrument. The preparation process and structure of the as-prepared coating were investigated to gain insights into its characteristics. The HfO2 coating effectively prevents direct contact between Ir and O, leading to a reduction in the oxidation rate of Ir. Furthermore, defects such as micropores and cracks generated during sealed oxidation erosion contribute to Ir’s decelerated oxidation failure. The as-prepared HfO2 coating exhibits low thermal conductivity and a high heat radiation rate, reducing the coating’s surface temperature. These characteristics significantly enhance adversity tolerance and increase the working temperature of the coating. Moreover, the as-prepared HfO2 coating can serve as a diffusion barrier, blocking both the direct contact of O with the Ir coating and the diffusion of other elements to the Ir coating. As a result, the rates of diffusion of other elements to the Ir coating are reduced.