Influence of Sputtering Power of ZrB2 Target on Structure and Properties of Nanocomposite Zr-B-O Films

Abstract

The nanocomposite Zr-B-O films based on ZrB2 and ZrO2 are successfully deposited on Si (100) and stainless-steel substrates via a multi-target magnetron co-sputtering system. The influence of the sputtering power of ZrB2 target on sample structure and performance was analyzed by scanning electron microscope (SEM), transmission electron microscope (TEM), X-ray diffraction (XRD), and X-ray photoelectron spectrometer (XPS). Nano scratch tests were conducted to measure the films’ mechanical properties. Their oxidation resistance in an aerobic environment was tested by high-temperature oxidation in a muffle furnace. Corrosion behaviors of the Zr-B-O films were evaluated by potentiodynamic polarization and electrochemical impedance spectroscopy. It shows that the interior of the composite films has a high degree of non-crystallization. The maximum hardness (26.76 GPa) and corresponding elastic modulus (268.05 Gpa) of the film were obtained at the sputtering power of 120 W. The hardest film also shows the better oxidation resistance with a mass change of around 0.1% before and after oxidation under 1000 °C for 1 h. However, the corrosion resistance of Zr-B-O nanocomposite films is negatively correlated with the power of ZrB2, which is related to the microstructure of the composite film.