Ultra-Structural Surface Characteristics of Dental Silane Monolayers

Abstract

This study aims to study the formation quality of the film of dental silanes. Two dental silanes, 3-methacryloxyproyltrimethoxysilane (MPS) and 3-acryloyloxypropyltrimethoxysilane (ACPS), were deposited on the silica glass-equivalent model surface (i.e., n-type silicon(100) wafer) by varying the deposition time (5 h and 22 h). The film quality was then evaluated by ellipsometry, surface contact angle (CA) and surface free energy (SFE), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) in survey and high-resolution modes on Si2p, O1s and C1s. Ellipsometry confirmed that both silanes at the two different deposition times would produce 0.85–1.22 nm thick self-assembled monolayer on the silicon wafer surface. While the water CA of silanized surfaces (60.7–71.5°) was larger than the surface without silane (29.6°), the SFE values of all silanes (40.0–44.5 mN/m) were slightly less than that of the wafer surface (46.3 mN/m). AFM revealed that the MPS with 22 h silanization yielded a significantly higher roughness (0.597 μm) than other groups (0.254–0.297 μm). High-resolution XPS on C1s identified a prominent peak at 288.5 eV, which corresponds to methacrylate O-C*=O, i.e., the silane monolayer is extended fully in the vertical direction, while others are in defect states. This study proves that different dental silanes under various dipping times yield different chemical qualities of the film even if they look thin physically.