Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture

Author:

Kapran Anna12ORCID,Hippler Rainer13ORCID,Wulff Harm3ORCID,Olejnicek Jiri1ORCID,Volfova Lenka1ORCID,Pisarikova Aneta14ORCID,Nepomniashchaia Natalia15ORCID,Cada Martin1ORCID,Hubicka Zdenek1ORCID

Affiliation:

1. Institute of Physics, Czech Academy of Sciences, Na Slovance 2, 18221 Prague, Czech Republic

2. Faculty of Mathematics and Physics, Charles University, Ke Karlovu 3, 12116 Prague, Czech Republic

3. Institut für Physik, Universität Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany

4. Joint Laboratory of Optics, Palacky University Olomouc, Av. 17. listopadu 50A, 77207 Olomouc, Czech Republic

5. Faculty of Nuclear Sciences and Physical Engineering, Czech Technical University in Prague, Brehova 7, 11519 Prague, Czech Republic

Abstract

Cobalt nickel oxide films are deposited on Si(111) or fluorine-doped tin-oxide-coated (FTO) glass substrates employing a pulsed hollow-cathode discharge. The hollow cathode is operated with argon gas flowing through the nozzle and with O2 gas admitted to the vacuum chamber. Three different cathode compositions (Co20Ni80, Co50Ni50, and Co80Ni20) are investigated. Deposited and annealed thin films are characterized by X-ray diffraction, infrared (Raman) spectroscopy, and ellipsometry. As-deposited films consist of a single mixed cobalt nickel oxide phase. Upon annealing at 600 °C, the mixed cobalt nickel oxide phase separates into two cystalline sub-phases which consist of cubic NiO and cubic Co3O4. Annealed films are investigated by spectroscopic ellipsometry and the optical bandgaps are determined.

Funder

Technology Agency of the Czech Republic

Publisher

MDPI AG

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3