Dependence of Structural and Optical Performance of Lanthanum Fluoride Antireflective Films on O Impurities

Author:

Lu Wenli,Pan Bo,Miao Ruiying,Yang Bingzheng,Yu Chuang,Zhang Dongwei,Chen Dehong,Han Liguo,Wang Zhiqiang

Abstract

Lanthanum fluoride (LaF3) thin films were deposited on the Ge substrate using the molybdenum boat evaporation method. The effect of films’ oxygen impurity on the infrared optical properties has been investigated for the first time in this report. With the increase in oxygen content in the films, the F content decreases, and the O/F ratio decreases from 0.160 to 0.055. XRD patterns reveal that the presence of O impurity destroys the crystal structure integrity of the LaF3 films and leads to the intensification of infrared absorption. The average transmittance decreases from 58.1% to 52.2%, and the peak transmittance decreases from 59.9% to 54.5%. Additionally, the refractive index and extinction coefficient of LaF3 films with different oxygen content are obtained by fitting the transmittance test data. The results show that the refractive index and extinction coefficient of the films in 8–12 μm increase with the increase in oxygen content, the average refractive index increases from 1.339 to 1.478, and the extinction coefficient increases from 0.001 to 0.030. In this paper, the influence of oxygen impurity in the LaF3 film on its infrared optical properties is revealed, which lays a theoretical foundation for the development of high-performance LaF3 infrared antireflective film.

Funder

the Gas Turbine Major Project

Publisher

MDPI AG

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3