Evolutions of the Microstructure and Properties of the (CrMoNbTaZr)NX Films Prepared by Reactive Magnetron Sputtering: Effects of Stoichiometry and Crystallinity

Abstract

(CrMoNbTaZr)NX coatings were deposited on Si (100) by magnetron sputtering under various N2/(Ar+N2) flow ratios. An X-ray diffractometer, transmission electron microscopy, scanning electron microscopy and atomic force microscopy were used to characterize the crystallinity and microstructure of the films. The elemental composition was characterized by energy dispersive spectroscopy and X-ray photoelectron spectroscopy. The hardness and friction coefficient were respectively determined by nanoindentation and nanoscratch. The sheet resistance was studied using a four-point probe. The results suggest that the crystallinity is strongly influenced by the nitrogen content in the films. The chemical stoichiometry of nitride determines the evolutions of the microstructure, mechanical properties and resistivity. Correlations between the microstructure and the properties of the (CrMoNbTaZr)NX films were studied.