Author:
Szczepaniak Marta Ewa,Krasowski Michał,Bołtacz-Rzepkowska Elżbieta
Abstract
The long-term success of a composite restoration largely depends on its smoothness, which can be achieved by the appropriate polishing tools and material selection. The purpose of this study was to evaluate the surface roughness of two composite materials after the application of selected polishing systems. Filtek Ultimate (FU) and Filtek Z250 (FZ) were tested. Forty specimens of each material were prepared. After polymerization under a Mylar strip, the surface roughness of five samples from each group was measured. Subsequently, all specimens were ground by 600 grit sandpaper. The surface roughness of five samples per group was tested again. The samples from each group were randomly assigned to eight subgroups, and polished by Sof-Lex, Sof-Lex Diamond Polishing System, Super Snap, One Gloss, Astrobrush, Stainbuster, Enamel Shiny, and Jiffy Polishing System. The collected data were analyzed using the Shapiro–Wilk and Kruskal–Wallis tests. The lowest Ra coefficient after polishing is found in the Super Snap groups (FU—0.077 μm, FZ—0.085 μm). The lowest Rlr coefficient is measured in the Enamel Shiny group for FU (1.000), and for Sof-Lex, Sof-Lex Diamond Polishing System, and Jiffy Polishing Kit for FZ (1.001), and only slightly higher for Super Snap (FU—1.001, FZ—1.002). The roughest-measured surface is in the One Gloss group for FU (Ra—0.657 µm, Rlr—1.009), and Astrobrush group for FZ (Ra—0.525 μm, Rlr—0.011). Additionally, it was not confirmed that the nanoparticle material (FU) demonstrates better results than the microhybrid one (FZ). Different polishing systems produce varying surface roughness. The most effective polishing system is Super Snap. The structure of composites does not significantly affect their surface roughness after polishing.
Funder
Polish Ministry of Science and Higer Education and by Medical University in Łódź
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces
Cited by
8 articles.
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