Deposition and Patterning of Polycrystalline Diamond Films Using Traditional Photolithography and Reactive Ion Etching-Reference-Cited by-同舟云学术

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Deposition and Patterning of Polycrystalline Diamond Films Using Traditional Photolithography and Reactive Ion Etching

Published:2017-09-15 Issue:9 Volume:7 Page:148
ISSN:2079-6412
Container-title:Coatings
language:en
Short-container-title:Coatings

Author:

Linnik Stepan,Okhotnikov Vitalii,Gaydaychuk Alexander

Publisher

MDPI AG

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces

Link

http://www.mdpi.com/2079-6412/7/9/148/pdf

Reference17 articles.

1. Deposition chemistry: Deposition pathways, nucleation, and growth;Asmussen,2002

2. Diamond coatings

3. Diamond semiconductor technology for RF device applications

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Overview of the CMS beam loss monitoring system (BCML) and diamond detectors surface modification;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2019-08

2. Low-Coherence Interferometer with Nanocrystalline Diamond Films with Potential Application to Measure Small Biological Samples;physica status solidi (a);2018-06-20

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