Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering-Reference-Cited by-同舟云学术

Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering

Published:2017-11-23 Issue:12 Volume:7 Page:209
ISSN:2079-6412
Container-title:Coatings
language:en
Short-container-title:Coatings

Author:

Zaman Anna^ORCID,Meletis Efstathios

Publisher

MDPI AG

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces

Link

http://www.mdpi.com/2079-6412/7/12/209/pdf

Reference39 articles.

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2. TiN: A Review of the Present Understanding of the Atomic Electronic Structure and Recent Results on the Growth and Physical Properties of Epitaxial TiNx (0.6 < x < 1.2) Layers;Sundgren,1986

3. Effect of deposition and annealing temperature on mechanical properties of TaN film

4. Reactive sputter deposition and properties of TaxN thin films

5. Growth of Tantalum Nitride Films on Si by Radio Frequency Reactive Sputtering of Ta in N[sub 2]/Ar Gas Mixtures: Effect of Bias

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