Modelling Particle Motion during High-Voltage Electrostatic Abrasive Implantation Based on Multi-Physics Field Coupling

Abstract

Electrostatic abrasive implantation technology is a classical process based on electrostatic field to implant abrasive particles into base material. However, there is still not a quantitative model to ensure the implantation performance due to the fact that the electrostatic abrasive implantation is a complex multi-physics coupled process. To ensure the quality of sandpaper and elucidate the complex motion mechanism of Al2O3 based abrasive particles in a high voltage electrostatic field, a multi-physical field coupling simulation model is proposed. First, the mechanical model is constructed for the complex problem of the electrostatic abrasive implantation process. Then, the field model is established for the problem that the superposition of multi-physical fields leads to complicated environmental conditions. Finally, the evaluation model is established for the problems that the abrasive planting effect is difficult to evaluate and the planting parameters are difficult to adjust. Besides, a tailored electrostatic abrasive planting testing equipment is designed for the implantation performance analysis purpose. Single-parameter electrostatic abrasive planting experiments were conducted to analyze and verify the effect of different pole plate voltage and pole plate spacing on the abrasive implantation rate. To ensure the implantation performance, the applicable pole plate spacing ranges from 30 mm to 50 mm and the suitable voltage is 20–40 kV according to the simulation result in the proposed two models. Meanwhile, the implantation rate experimentation shows the coupling field model coincides with the experiments better. The key factors affecting the electrostatic abrasive planting process are identified, and a feasible multi-physical field coupled abrasive particle motion simulation model is proposed.